PECVD 等離子增強化學氣相淀積系統 STS 310 PECVD_allwin21
SYSTEM SPECIFICATION AND TECHNICAL DATA
High Temperature Electrode (allows up to 360 degree C)
Can be configured for 6 x 3",or 4 x 4" wafers
4" pumping port, throttle valve, high vac valve, foreline.
Current Gas configuration.
Gas lines- MFC are Tylan 2900 type
SF6 or CF4 MFC
N2O MFC
NH3 – 50 sccm, MFC
O2 – 3000 sccm, MFC
SiH4 - 3000sccm MFC
O2 is interlocked from NH3, SiH4 lines
RF power supply:187.5 KHz, 500 watts output and 13.56MHz watts output. There is a switch for 187.5KHz RF Power 500W to double the frequency to be 375 KHz.Edwards
E2M40 rotary pump with Edwards 250 blower.
本公司可提供涵蓋快速退火、去膠、刻蝕、測試等工藝的全新或翻新的半導體設備及備件。通過技藝精湛的設備翻新和先進的軟件升級及技術測試，可以保證我們的設備具有出色的運作表現，能夠滿足客戶的多種需求，降低客戶的生產成本。
本公司有快速退火爐RTP（保護氣氛熱處理爐）Allwin21 AG610 、EG2001/2010/1034探針臺;HP4062/HP4145測試儀;AW-PCM測試軟件；探針臺Wentworth MP 2020；PECVD等離子增強化學氣相淀積系統 STS 310 PECVD_allwin21等.
公司在北京、南京、廣東等地設有辦事機構，致力于為客戶提供完善的服務與支持。((Email: peterchen@allwin21.com http://www.allwin21.com )
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